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Alpha Plasma

Alpha Plasma
Alpha Plasma Systems

In principle plasma processes can be classified in the following categories:
Cleaning, activation and coating. To conduct a process under low pressure plasma the following technical equipment is needed:

Vacuum pump
To reach the needed low pressure in the process chamber of ca. 0,5 to 1,5 mbar, depending on application, so called dry running water meters or with oil greased vacuum pumps are employed. Particular attention is paid to the choice of oils. Especially at the utilization of oxygen as process gas, the application of oils specially suited for this process is recommended..

Induction of high-frequency
For initiation or ionization of the process gases, a high-frequency is inducted. For that purpose generators or magnetrons are applied with a frequency, which is approved by the lawgiver for technical utilization. In the process frequencies in the area of KHz, MHz and GHz are applied.
Each of these frequencies has its particular properties and should be chosen in accordance with its application.

Gas flow and measuring components
According to requirements, manual or electronic mass flow controllers are applied. Due to the reproducibility or at the application of gaseous mixtures, electronic mass flow controllers are required

Plasma equipment of series AL

Plasma equipment of series AL

Plasma equipment of series AL

The AL stands for aluminum chamber. 

This plasma equipment is mostly used in semi-conductor technology, solar-, plastics and electronic industry to activate plastics surfaces or to create ultrapure surfaces.

Application examples:
Pre treatment of metal and plastics parts prior to bonding, gluing, varnishing or printing. Micro cleaning of glasses, metals, ceramics or other vacuum suitable substrates.

AL 18 Tabletop Unit

AL 18 Tabletop Unit

  • Dimensions: L: 530mm W: 600mm H: 550mm
  • Weight: 40 KG
  • Volume: 18 litres
  • Process chamber: aluminium, L: 250mm W: 290mm H:250mm
  • Microwave output: 2,45 GHz / zw. 50 - 1200 Watt
  • Incl. 1 Gaskanal (gas distribution system inside the process chamber), up to 3 channels available
  • Substrate holder (optional): aluminium, custom design possible
  • Vacuum connection: DN 25 ISO-KF
  • Venting: electromagnetic solenoid valve
  • Pump system: 15-35 m³/h
  • Chamber door: hinged-type with viewing port
AL 18 (19 inch rack)

AL 18 (19 inch Rack)

  • Dimensions: L: 530mm W: 600mm H: 1800mm
  • Weight: 95 KG
  • Volume: 18 litres
  • Process chamber: aluminium, L: 250mm W: 290mm H:250mm
  • Microwave output: 2,45 GHz / zw. 50 - 1200 Watt
  • Incl. 1 Gaskanal (gas distribution system inside the process chamber), up to 3 channels available
  • Substrate holder (optional): aluminium, custom design possible
  • Vacuum connection: DN 25 ISO-KF
  • Venting: electromagnetic solenoid valve
  • Pump system: 15-35 m³/h
  • Chamber door: hinged-type with viewing port
AL 76 Tabletop Unit

AL 76 Tabletop Unit

  • Dimensions: L: 770mm W: 780mm H:780mm
  • Weight: 80 KG
  • Volume: 76 litres
  • Process chamber: aluminium, L: 400mm W: 480mm H:400mm
  • Microwave output: 2,45 GHz / zw. 50 - 1200 Watt
  • Incl. 1 Gaskanal (gas distribution system inside the process chamber), up to 3 channels available
  • Substrate holder (optional): aluminium, custom design possible
  • Vacuum connection: DN 40 ISO-KF
  • Venting: electromagnetic solenoid valve
  • Pump system: up to 250m³/h
  • Chamber door: you can choose between hinged-type with viewing port, drawer door or universal door
AL 76/100 Compact

AL 100 Compact

  • Dimensions: L: 1050mm W: 800mm H:2020mm
  • Weight: 95 KG
  • Volume: 100 litres
  • Process chamber: aluminium, L: 400mm W: 480mm H:520mm
  • Microwave output: 2,45 GHz / zw. 50 - 1200 Watt
  • Incl. 1 Gaskanal (gas distribution system inside the process chamber), up to 3 channels available
  • Substrate holder (optional): aluminium, custom design possible
  • Vacuum connection: DN 63 ISO-KF
  • Venting: electromagnetic solenoid valve
  • Pump system: up to 250m³/h
  • Chamber door: you can choose between hinged-type with viewing port, drawer door or universal door
AL 140/160/300

AL 140/160/300

  • Dimensions: L: 1200mm W: 900mm H:1800mm
  • Weight: 250 KG
  • Volume: customizable from 140-300 litres
  • Process chamber: aluminium, modfied chamber size
  • Microwave output: 2,45 GHz / zw. 50 - 1200 Watt
  • Incl. 1 Gaskanal (gas distribution system inside the process chamber), up to 3 channels available
  • Substrate holder (optional): aluminium, custom design possible
  • Vacuum connection: DN 63 ISO-KF
  • Venting: electromagnetic solenoid valve
  • Pump system: up to 250m³/h
  • Chamber door: you can choose between hinged-type with viewing port, drawer door or universal door
AL 800

AL 800 Compact

  • Dimensions: L: 1200mm W: 900mm H:1800mm
  • Weight: 300 KG
  • Volume: 800 litres
  • Process chamber: aluminium, L:900 W:920 H:900
  • Microwave output: 2,45 GHz / zw. 50 - 1200 Watt
  • Incl. 1 Gaskanal (gas distribution system inside the process chamber), up to 3 channels available
  • Substrate holder (optional): aluminium, custom design possible
  • Vacuum connection: DN 63 ISO-KF
  • Venting: electromagnetic solenoid valve
  • Pump system: up to 250m³/h
  • Chamber door: you can choose between hinged-type with viewing port, drawer door or universal door
Plasma equipment of series Q

Plasma equipment of series Q

The Q stands for quartz glass chambers.

Plasma equipment of series Q are mostly used in semi-conductor technology and in the area of analysis and medical technology.

Application examples:
Cleaning and incineration of organic samples and varnishes in micro mechanics as well as for silicium wafers in semi-conductor industry.

Q150 (Tabletop Unit)

Q150 (Tabletop Unit)

  • Dimensions: L: 500mm W: 550mm H:370mm
  • Weight: 40 KG
  • Volume: 6 litres
  • Process chamber: quartz glass, 145mm Ø, B:260mm
  • Microwave output: 2,45 GHz / between 50 - 1200 Watt
  • Incl. 1 Gaskanal (gas distribution system inside the process chamber), up to 3 channels available
  • Substrate holder (optional): aluminium, custom design possible
  • Vacuum connection: DN 25 ISO-KF
  • Venting: electromagnetic solenoid valve
  • Pump system: up to 25m³/h
  • Chamber door: you can choose between hinged-type with viewing port and drawer door with attached support rods
  • Wafer size: up to 125mm, at a number of 25 wafers
Q 235 Alpha Plasma System

Q235

  • Dimensions: L: 620mm W: 550mm H:500mm
  • Weight: 75 KG
  • Volume: 1 litres
  • Process chamber: quartz glass, 230mm Ø, B:260mm
  • Microwave output: 2,45 GHz / between 50 - 1200 Watt
  • Incl. 1 Gaskanal (gas distribution system inside the process chamber), up to 3 channels available
  • Substrate holder (optional): aluminium, custom design possible
  • Vacuum connection: DN 40 ISO-KF
  • Venting: electromagnetic solenoid valve
  • Pump system: up to 25m³/h
  • Chamber door: you can choose between hinged-type with viewing port and drawer door with attached support rods
  • Wafer size: up to 150mm, at a number of 25 wafers
Q240

Q240

  • Dimensions: L: 760mm W: 775mm H:775mm
  • Weight: 100 KG
  • Volume: 21 litres
  • Process chamber: quartz glass, 240mm Ø, B:440mm
  • Microwave output: 2,45 GHz / between 50 - 1200 Watt
  • Incl. 1 Gaskanal (gas distribution system inside the process chamber), up to 3 channels available
  • Substrate holder (optional): aluminium, custom design possible
  • Vacuum connection: DN 40 ISO-KF
  • Venting: electromagnetic solenoid valve
  • Pump system: up to 40m³/h
  • Chamber door: you can choose between hinged-type with viewing port and drawer door with attached support rods
  • Wafer size: up to 200mm, at a number of 25 wafers

Modified Machines

AL 250 Desmearing System

Desmearing System AL 250

  • Dimensions: L: 550mm W: 1900mm H:900mm
  • Weight: 180 KG
  • Volume: 250 litres
  • Porcess chamber: aluminum with panel holder:
    • panel holder : L: 400mm B: 650mm H: 800mm
    • circuit boards: bis zu 4/5 Platten mit 18x24" oder 20x24"
  • LF-output (Low Frequency): operating frequency = 40 KHz, bis zu 2000 Watt
  • Incl. 1 Gaskanal (gas distribution system inside the process chamber), up to 6 channels available
  • Substrate holder (optional): aluminium, custom design possible
  • Vacuum connection: DN 63 ISO-KF
  • Venting: electromagnetic solenoid valve
  • Pump system: up to 250m³/h
  • Chamber door: hinged-type with viewing port 
Plasma Polymerisation/Cluster Tool

Plasma cleaning- and polymerisation tool

  • Dimensions: L: 2000mm W: 1800mm H:2000mm
  • Weight: ~320 KG
  • Volume: 30 litres per chamber
  • Airlock: 50 litres
  • Process chamber: aluminium, L:300 W:300 H:300
  • Microwave output: 2,45 GHz / between 50 - 1200 Watt / 13,56 MHz, 600 Watt
  • Incl. 3x3 Gaskanal (gas distribution system inside the process chamber)
  • Air lock robot: example sample holder for airlock
  • Vacuum connection: DN 63 ISO-KF
  • Venting: electromagnetic solenoid valve
  • Pump system: 3 x 40m³/h
  • Chamber door: maintenance doors